EVG EV620 EV6xx Software Custom Key Generator
EVG EV620 EV6xx Software Test with Custom Key Generator
Known for its versatility and reliability, the EVG620 NT provides modern-day mask alignment era on a minimized
footprint region mixed with superior alignment capabilities and optimized total value of ownership.
It is an ideal tool for optical double-facet lithography available in semi-automatic or automated configuration with optionally available
full-housing Gen 2 answer to meet high-quantity production requirements and fab standards.
Operator-friendly software, minimized time for mask and tooling changes, in addition to efficient worldwide service and help makes it the right answer for any manufacturing environment.
The EVG620 NT or the absolutely housed EVG620 NT Gen2 masks alignment structures are geared up with incorporated vibration isolation, and achieve super exposure outcomes for a wide variety of applications, including exposure of skinny and thick resists, patterning of deep cavities and similar topographies, as well as processing of skinny and fragile materials which include compound semiconductors. Furthermore, the EVG’s proprietary SmartNIL era is supported on each semi-computerized and completely automated device configurations.
